Awarded contract

Electron Beam Lithography Tool Procurement

Awarded
£4m
Published 8 Jul 2026

Procurement of an electron beam lithography tool for precision semiconductor and nanofabrication applications.

United Kingdom· ScotlandPublished 8 Jul 2026· 1 months agoFind a Tender

Decision brief

4 fields
  • Contract value
    £4,017,750
    Pounds sterling
  • Closing date
    Rolling
    No closing date published
  • Sector
    Browse related listings
  • Location
    United Kingdom
    Scotland

Suppliers

1 supplier

Lifecycle

Awarded

Contract awarded. Originally published 1 months ago.

8 July 2026
Awarded — no open tender advertised

Brief

This procurement opportunity seeks qualified suppliers to provide and deliver an electron beam lithography (EBL) tool. The EBL tool will be used for precision microfabrication and nanofabrication applications, enabling high-resolution patterning of semiconductor materials and substrates. Suppliers should be prepared to provide technical specifications, installation support, training, and post-delivery maintenance services. The tool must meet specified performance requirements for beam resolution, pattern accuracy, and throughput. Interested vendors should demonstrate relevant experience in supplying advanced lithography equipment and provide comprehensive documentation of system capabilities and compliance with project requirements.

Track record

4 awards · 3 winners
Open field

No single supplier dominates the field.

In research innovation, University of Glasgow has awarded 4 contracts to 3 suppliers.

Who wins here
  1. Raith GmbH1× · 25%
  2. Anton Paar1× · 25%

Across research innovation, the most active winners are WOLF LABORATORIES LIMITED, MV CORPORATION EOOD, Altium International s.r.o. — the field to beat, or your route in as a partner.

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